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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Geometrically induced dose correction method for e-beam lithography applications

Galler, R., Choi, K.-H., Gutsch, M., Hohle, C., Krueger, M., Ramos, L. E., Suelzle, M., Weidenmueller, U., Montgomery, M. Warren, Maurer, Wilhelm

Рік:

2010

Мова:

english

Файл:

PDF, 4.35 MB

english, 2010

Optical critical dimension metrology for directed self-assembly assisted contact hole shrink

Dixit, Dhairya, Green, Avery, Hosler, Erik R., Kamineni, Vimal, Preil, Moshe E., Keller, Nick, Race, Joseph, Chun, Jun Sung, O’Sullivan, Michael, Khare, Prasanna, Montgomery, Warren, Diebold, Alain C.

Журнал:

Journal of Micro/Nanolithography MEMS and MOEMS

Рік:

2016

Мова:

english

Файл:

PDF, 7.08 MB

english, 2016

Why should marketing and manufacturing work together?: Some exploratory empirical results

Warren H. Hausman, David B. Montgomery, Aleda V. Roth

Журнал:

Journal of Operations Management

Рік:

2002

Мова:

english

Файл:

PDF, 184 KB

english, 2002

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Improving model prediction accuracy for ILT with aggressive SRAFs

Jung, Sunggon, Sim, Woojoo, Jeong, Moongyu, Ser, Junghoon, Lee, Sungwoo, Choi, Seoung-woon, Zhou, Xin, Luan, Lan, Cecil, Thomas, Son, Donghwan, Gleason, Robert, Kim, David, Montgomery, M. Warren, Maur

Рік:

2010

Мова:

english

Файл:

PDF, 1.45 MB

english, 2010

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 24 February 2008)] Optical Microlithography XXI - 22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP)

Bencher, Chris, Chen, Yongmei, Dai, Huixiong, Montgomery, Warren, Huli, Lior, Levinson, Harry J., Dusa, Mircea V.

Рік:

2008

Мова:

english

Файл:

PDF, 403 KB

english, 2008

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Direct write electron beam lithography: a historical overview

Pfeiffer, Hans C., Montgomery, M. Warren, Maurer, Wilhelm

Рік:

2010

Мова:

english

Файл:

PDF, 845 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Correlation of overlay performance and reticle substrate non-flatness effects in EUV lithography

Raghunathan, Sudhar, Zurbrick, Larry S., Montgomery, M. Warren, Munder, Adam, Hartley, John, Sohn, Jaewoong, Orvek, Kevin

Рік:

2009

Мова:

english

Файл:

PDF, 1000 KB

english, 2009

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Development and characterization of a thinner binary mask absorber for 22-nm node and beyond

Faure, Tom, Montgomery, M. Warren, Maurer, Wilhelm, Badger, Karen, Kindt, Louis, Kodera, Yutaka, Komizo, Toru, Kondo, Shinpei, Mizoguchi, Takashi, Nemoto, Satoru, Seki, Kazunori, Senna, Tasuku, Wistro

Рік:

2010

Мова:

english

Файл:

PDF, 1.88 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Using principal component analysis for photomask CD signature investigations

Cantrell, G. R., Montgomery, M. Warren, Maurer, Wilhelm, Bürgel, Christian, Feicke, Axel, Sczyrba, Martin, Utzny, Clemens

Рік:

2010

Мова:

english

Файл:

PDF, 283 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - A systematic approach to the determination of SRAF capabilities in high end mask manufacturing

Bürgel, Christian, Montgomery, M. Warren, Maurer, Wilhelm, Sczyrba, Martin, Cantrell, G. R.

Рік:

2010

Мова:

english

Файл:

PDF, 1.49 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - A systematic study of source error in source mask optimization

Alleaume, C., Yesilada, E., Farys, V., Depre, L., Arnoux, V., Li, Zhipan, Trouiller, Y., Serebriakov, A., Montgomery, M. Warren, Maurer, Wilhelm

Рік:

2010

Мова:

english

Файл:

PDF, 665 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - 6-inch circle template fabrication for patterned media using a conventional resist and new chemically amplified resists

Hoga, Morihisa, Zurbrick, Larry S., Montgomery, M. Warren, Fukuda, Masaharu, Chiba, Tsuyoshi, Ishikawa, Mikio, Itoh, Kimio, Kurihara, Masaaki, Toyama, Nobuhito, Hayashi, Naoya

Рік:

2009

Мова:

english

Файл:

PDF, 13.39 MB

english, 2009

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Plasma monitoring of chrome dry etching for mask making

Kwon, Sung-Won, Montgomery, M. Warren, Maurer, Wilhelm, Kim, Dong-Chan, Nam, Dong-Seok, Woo, Sang-Gyun, Cho, Han-Ku

Рік:

2010

Мова:

english

Файл:

PDF, 596 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Substrate aware OPC rules for edge effect in block levels

Shao, Dongbing, Montgomery, M. Warren, Maurer, Wilhelm, Bailey, Todd C., Stobert, Ian, Popova, Irene, Chang, Chan Sam

Рік:

2010

Мова:

english

Файл:

PDF, 1.16 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Mask Industry Assessment: 2010

Hughes, Greg, Montgomery, M. Warren, Maurer, Wilhelm, Chan, David Y.

Рік:

2010

Мова:

english

Файл:

PDF, 472 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - New method to determine process window considering pattern failure

Yang, Seung-Hune, Montgomery, M. Warren, Maurer, Wilhelm, Moon, Seongho, Ser, Junghoon, Kim, Young-Chang, Choi, Sung-Woon, Kang, Chang-Jin

Рік:

2010

Мова:

english

Файл:

PDF, 2.16 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Advanced cleaning of nano-imprint lithography template in patterned media applications

Singh, Sherjang, Montgomery, M. Warren, Maurer, Wilhelm, Chen, Ssuwei, Dress, Peter, Kurataka, Nobuo, Gauzner, Gene, Dietze, Uwe

Рік:

2010

Мова:

english

Файл:

PDF, 12.37 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Investigation of the influence of resist patterning on absorber LWR for 22-nm-node EUV lithography

Inazuki, Yuichi, Montgomery, M. Warren, Maurer, Wilhelm, Shimomura, Takeya, Abe, Tsukasa, Ogase, Taichi, Kawashima, Satoshi, Takigawa, Tadahiko, Mohri, Hiroshi, Hayashi, Naoya

Рік:

2010

Мова:

english

Файл:

PDF, 927 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - E-beam direct write (EBDW) as complementary lithography

Lam, David, Montgomery, M. Warren, Maurer, Wilhelm, Liu, Dave, Prescop, Ted

Рік:

2010

Мова:

english

Файл:

PDF, 372 KB

english, 2010

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 21 February 2016)] Extreme Ultraviolet (EUV) Lithography VII - Benchmarking study of EUV resists for NXE:3300B

Panning, Eric M., Goldberg, Kenneth A., Fan, Yu-Jen, Mellish, Mac, Chun, Jun Sung, McWilliams, Scott, Montgomery, Cecilia, Montgomery, Warren

Рік:

2016

Мова:

english

Файл:

PDF, 7.61 MB

english, 2016

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Advanced binary film for 193nm lithography extension to sub-32-nm node

Nozawa, Osamu, Montgomery, M. Warren, Maurer, Wilhelm, Shishido, Hiroaki, Hashimoto, Masahiro, Ohkubo, Yasushi, Mitsui, Hideaki

Рік:

2010

Мова:

english

Файл:

PDF, 1.02 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - 6-inch circle template fabrication for patterned media

Itoh, Kimio, Montgomery, M. Warren, Maurer, Wilhelm, Hoga, Morihisa, Toyama, Nobuhito

Рік:

2010

Мова:

english

Файл:

PDF, 4.72 MB

english, 2010

Clinical response to varying the stimulus parameters in deep brain stimulation for essential tremor

Alexis M. Kuncel, Scott E. Cooper, Barbara R. Wolgamuth, Merlise A. Clyde, Scott A. Snyder, Erwin B. Montgomery Jr., Ali R. Rezai, Warren M. Grill

Журнал:

Movement Disorders

Рік:

2006

Мова:

english

Файл:

PDF, 199 KB

english, 2006

Market Driven Manufacturing

Warren H. Hausman, David B. Montgomery

Журнал:

Journal of Market-Focused Management

Рік:

1997

Мова:

english

Файл:

PDF, 142 KB

english, 1997

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Impact of mask topography and multilayer stack on high NA imaging of EUV masks

Ruoff, Johannes, Montgomery, M. Warren, Maurer, Wilhelm

Рік:

2010

Мова:

english

Файл:

PDF, 641 KB

english, 2010

A phase I-II study of the histone deacetylase inhibitor vorinostat plus sequential weekly paclitaxel and doxorubicin-cyclophosphamide in locally advanced breast cancer

Tu, Yifan, Hershman, Dawn L., Bhalla, Kapil, Fiskus, Warren, Pellegrino, Christine M., Andreopoulou, Eleni, Makower, Della, Kalinsky, Kevin, Fehn, Karen, Fineberg, Susan, Negassa, Abdissa, Montgomery,

Журнал:

Breast Cancer Research and Treatment

Рік:

2014

Мова:

english

Файл:

PDF, 447 KB

english, 2014

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Two complementary methods to characterize long range proximity effects due to develop loading

Sundberg, Linda K., Wallraff, Greg M., Friz, Alexander M., Davis, Blake, Zweber, Amy E., Lovchik, Robert, Delamarche, Emmanuel, Senna, Tasuku, Komizo, Toru, Hinsberg, William D., Montgomery, M. Warren

Рік:

2010

Мова:

english

Файл:

PDF, 2.96 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Study of EUV mask inspection technique using DUV light source for hp22nm and beyond

Hirano, Ryoichi, Kikuiri, Nobutaka, Hashimoto, Hideaki, Takahara, Kenichi, Hirono, Masatoshi, Shigemura, Hiroyuki, Montgomery, M. Warren, Maurer, Wilhelm

Рік:

2010

Мова:

english

Файл:

PDF, 1.08 MB

english, 2010

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Advances in Resist Materials and Processing Technology XXVIII - Development of an inorganic nanoparticle photoresist for EUV, e-beam, and 193nm lithography

Krysak, Marie, Allen, Robert D., Somervell, Mark H., Trikeriotis, Markos, Schwartz, Evan, Lafferty, Neal, Xie, Peng, Smith, Bruce, Zimmerman, Paul, Montgomery, Warren, Giannelis, Emmanuel, Ober, Chris

Рік:

2011

Мова:

english

Файл:

PDF, 2.34 MB

english, 2011

Measurements of sharing in Multics

Montgomery, Warren A.

Журнал:

ACM SIGOPS Operating Systems Review

Рік:

1977

Мова:

english

Файл:

PDF, 496 KB

english, 1977

[ACM Press the sixth symposium - West Lafayette, Indiana, United States (1977.11.16-1977.11.18)] Proceedings of the sixth symposium on Operating systems principles - SOSP '77 - Measurements of sharing in Multics

Montgomery, Warren A.

Рік:

1977

Мова:

english

Файл:

PDF, 496 KB

english, 1977

SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - Nonmetallic acid generators for i-line and g-line chemically amplified resists

Brunsvold, William R., Montgomery, Warren, Hwang, Bao, Ito, Hiroshi

Рік:

1991

Мова:

english

Файл:

PDF, 1.11 MB

english, 1991

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch

Anderson, Christopher N., Baclea-An, Lorie Mae, Denham, Paul E., George, Simi A., Goldberg, Kenneth A., Jones, Michael S., Smith, Nathan S., Wallow, Thomas I., Montgomery, Warren, Naulleau, Patrick P.

Рік:

2011

Мова:

english

Файл:

PDF, 4.64 MB

english, 2011

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, United States (Sunday 22 February 2015)] Extreme Ultraviolet (EUV) Lithography VI - The patterning center of excellence (CoE): an evolving lithographic enablement model

Wood, Obert R., Panning, Eric M., Montgomery, Warren, Chun, Jun Sung, Liehr, Michael, Tittnich, Michael

Рік:

2015

Мова:

english

Файл:

PDF, 715 KB

english, 2015

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Aerial plane inspection for advanced photomask defect detection

Kim, Won Sun, Zurbrick, Larry S., Montgomery, M. Warren, Park, Jin Hyung, Chung, Dong Hoon, Jeon, Chan Uk, Cho, Han Ku, Hutchinson, Trent, Lee, Oscar, Huang, William, Dayal, Aditya

Рік:

2009

Мова:

english

Файл:

PDF, 1.25 MB

english, 2009

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Advances in Resist Materials and Processing Technology XXVII - Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance

Chen, Lan, Allen, Robert D., Goh, Yong-Keng, Lawrie, Kirsten, Smith, Bruce, Montgomery, Warren, Zimmerman, Paul A., Blakey, Idriss, Whittaker, Andrew K.

Рік:

2010

Мова:

english

Файл:

PDF, 1.87 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - An advanced modeling approach for mask and wafer process simulation

Karakas, Ahmet, Montgomery, M. Warren, Maurer, Wilhelm, Elsen, Erich, Torunoglu, Ilhami, Andrus, Curtis

Рік:

2010

Мова:

english

Файл:

PDF, 600 KB

english, 2010

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology VIII - Kanagawa, Japan (Wednesday 25 April 2001)] Photomask and Next-Generation Lithography Mask Technology VIII - Photoresist processing for high-resolution DUV lithography at 257 nm

Fuller, Scott E., Montgomery, Warren, Albelo, Jeff A., Rodrigues, William, Buxbaum, Alex H., Kawahira, Hiroichi

Рік:

2001

Мова:

english

Файл:

PDF, 58 KB

english, 2001

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Effect of SRAF placement on process window for technology nodes that uses variable etch bias

Seoud, Ahmed M., Zurbrick, Larry S., Montgomery, M. Warren, Tawfik, Tamer M.

Рік:

2009

Мова:

english

Файл:

PDF, 347 KB

english, 2009

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Extensions of boundary layer modeling of photomask topography effects to fast-CAD using pattern matching

Miller, Marshal A., Zurbrick, Larry S., Montgomery, M. Warren, Yamazoe, Kenji, Neureuther, Andrew R.

Рік:

2009

Мова:

english

Файл:

PDF, 1.46 MB

english, 2009

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - An analysis of correlation between scanning direction and defect detection at ultra high resolution

Lim, Kwon, Montgomery, M. Warren, Maurer, Wilhelm, Choi, SungPil, Cho, Wonil, Chung, Dong Hoon, Jeon, Chan-Uk, Cho, HanKu

Рік:

2010

Мова:

english

Файл:

PDF, 750 KB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Expanding the lithography process window (PW) with CDC technology

Wang, Sz-Huei, Zurbrick, Larry S., Montgomery, M. Warren, Chen, Yu-Wan, Kuo, Chung Ming, Graitzer, Erez, Ben-Zvi, Guy, Cohen, Avi

Рік:

2009

Мова:

english

Файл:

PDF, 767 KB

english, 2009

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Metrology, Inspection, and Process Control for Microlithography XXV - Scatterometry for EUV lithography at the 22-nm node

Raymond, Christopher J., Bunday, Benjamin, Vartanian, Victor, Ren, Liping, Huang, George, Montgomery, Cecilia, Montgomery, Warren, Elia, Alex, Liu, Xiaoping

Рік:

2011

Мова:

english

Файл:

PDF, 4.27 MB

english, 2011

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Line width roughness control and pattern collapse solutions for EUV patterning

Petrillo, Karen, La Fontaine, Bruno M., Naulleau, Patrick P., Huang, George, Ashworth, Dominic, Georger, Jacque, Ren, Liping, Cho, K. Y., Montgomery, Warren, Wurm, Stefan, Kawakami, Shinichiro, Dunn,

Рік:

2011

Мова:

english

Файл:

PDF, 2.90 MB

english, 2011

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Inverse lithography (ILT) mask manufacturability for full-chip device

Kim, Byung-Gook, Zurbrick, Larry S., Montgomery, M. Warren, Suh, Sung Soo, Woo, Sang Gyun, Cho, HanKu, Xiao, Guangming, Son, Dong Hwan, Irby, Dave, Kim, David, Baik, Ki-Ho

Рік:

2009

Мова:

english

Файл:

PDF, 3.14 MB

english, 2009

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study

La Fontaine, Bruno M., Koh, Chawon, Georger, Jacque, Ren, Liping, Huang, George, Goodwin, Frank, Wurm, Stefan, Ashworth, Dominic, Montgomery, Warren, Pierson, Bill, Park, Joo-on, Naulleau, Patrick

Рік:

2010

Мова:

english

Файл:

PDF, 2.34 MB

english, 2010

SPIE Proceedings [SPIE Microlithography '90, 4-9 Mar, San Jose - San Jose, CA (Sunday 4 March 1990)] Advances in Resist Technology and Processing VII - Sensitivity enhancers for chemically amplified resists

Brunsvold, William R., Kwong, Ranee W., Montgomery, Warren, Moreau, Wayne M., Sachdev, Harbans S., Welsh, Kevin M., Watts, Michael P. C.

Рік:

1990

Мова:

english

Файл:

PDF, 704 KB

english, 1990

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Investigation of buried EUV mask defect printability using actinic inspection and fast simulation

Clifford, Chris H., Zurbrick, Larry S., Montgomery, M. Warren, Chan, Tina T., Neureuther, Andrew R., Goldberg, Kenneth A., Mochi, Iacopo, Liang, Ted

Рік:

2009

Мова:

english

Файл:

PDF, 729 KB

english, 2009

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Resist process windows in electron-beam lithography

Jamieson, Andrew T., Montgomery, M. Warren, Maurer, Wilhelm, Wilcox, Nathan, Kwok, Wai Y., Kim, Yong Kwan

Рік:

2010

Мова:

english

Файл:

PDF, 1.10 MB

english, 2010

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Plasma characterization of Tetra III chrome etch system

Grimbergen, Michael, Zurbrick, Larry S., Montgomery, M. Warren, Nest, D. G., Yu, Keven, Leung, T. Y. B., Chandrachood, Madhavi, Ouye, Alan, Singh, Saravjeet, Ibrahim, Ibrahim, Kumar, Ajay, Graves, Dav

Рік:

2009

Мова:

english

Файл:

PDF, 189 KB

english, 2009